Low-Temperature Growth of ZnO Thin Films by Linear Source Ultrasonic Spray Chemical Vapor Deposition
Low-Temperature Growth of ZnO Thin Films by Linear Source Ultrasonic Spray Chemical Vapor Deposition
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DOI：
10.1143/jjap.46.6811
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发表时间：
2007-10
影响因子：
1.5
通讯作者：
H. Nishinaka;T. Kawaharamura;S. Fujita
中科院分区：
文献类型：
--
作者：
H. Nishinaka;T. Kawaharamura;S. Fujita
采用线源超声喷雾化学气相沉积法在低温下在钠玻璃衬底和柔性聚酰亚胺薄膜上制备了ZnO薄膜。在180 °C下，在甲醇和水的混合物中使用乙酸锌在玻璃和聚酰亚胺上沉积高度透明的ZnO膜。低温下的沉积归因于水活化的前体反应。
ZnO films were prepared on soda-glass substrates and flexible polyimide films at low temperatures by linear source ultrasonic spray chemical vapor deposition without intentionally enhancing the energy of precursor reactions. Highly transparent ZnO films were deposited on both glass and polyimide at 180 °C using zinc acetate in a mixture of methanol and water. The deposition at low temperatures is attributed to water-activated precursor reactions.