Fabrication influences on deep-ultraviolet tungsten wire grid polarizers manufactured by double patterning.
Fabrication influences on deep-ultraviolet tungsten wire grid polarizers manufactured by double patterning.
复制标题
制造对双图案化制造的深紫外钨丝栅偏光片的影响。
作者：
T. Siefke;D. Lehr;Thomas Weber;D. Voigt;E. Kley;A. Tünnermann
当比较深紫外钨丝栅偏振器的预测和测量的光学性能时，通常会观察到实质性的差异。特别地，消光比被强烈地损害。因此，我们调查假设和实际实现的属性之间的主要差异，光栅结构的几何形状和材料作为这些差异的起源。我们发现一个潜在的改善一个数量级的消光比，通过改善材料和四个因素，通过改善几何形状。我们的研究结果允许有目的地修改的制造工艺，因此将显着有助于改善深紫外线栅偏振器。
Substantial discrepancies are commonly observed when comparing the predicted and measured optical performance of deep-ultraviolet tungsten wire grid polarizers. Particularly, the extinction ratio is strongly impaired. Therefore, we investigate major differences between assumed and actual achieved properties regarding geometry and material of the grating structure as the origin of theses discrepancies. We find an improvement potential for the extinction ratio of one order of magnitude by improving the material and a factor of four by improving the geometry. Our results allow for a purposeful revision of fabrication processes and will therefore significantly contribute to the improvement of deep-ultraviolet wire grid polarizers.