Enhanced Ionic Sensitivity in Solution-Gated Graphene-Hexagonal Boron Nitride Heterostructure Field-Effect Transistors
Enhanced Ionic Sensitivity in Solution-Gated Graphene-Hexagonal Boron Nitride Heterostructure Field-Effect Transistors
复制标题
DOI:
10.1002/admt.201800133
复制
发表时间:
2018-08-01
影响因子:
6.8
通讯作者:
Radadia, Adarsh D.
中科院分区:
文献类型:
--
作者:
Hasan, Nowzesh;Hou, Bo;Radadia, Adarsh D.
The charge transport in solution-gated graphene devices is affected by the impurities and disorder of the underlying dielectric interface and its interaction with the solution. Advancement in field-effect ion sensing by fabricating a dielectric isomorph, hexagonal boron nitride between graphene and silicon dioxide of a solution-gated graphene field-effect transistor is being reported. Ionic sensitivity of Dirac voltage as high as -198 mV per decade for K+ and -110 mV per decade for Ca(2+ )is recorded. Increased transconductance due to increased charge carrier mobility is accompanied with larger ionic sensitivity of the transconductance due to larger ionic sensitivity of the charge carrier mobility. These findings define a standard to construct future graphene devices for biosensing and bioelectronics applications.