Fabrication of Antireflective Subwavelength Structure on Spherical Glass Surface Using Imprinting Process
Fabrication of Antireflective Subwavelength Structure on Spherical Glass Surface Using Imprinting Process
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DOI：
10.1143/apex.3.112501
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发表时间：
2010-01-01
影响因子：
2.3
通讯作者：
Nishii, Junji
中科院分区：
文献类型：
--
作者：
Tamura, Takamasa;Umetani, Makoto;Nishii, Junji
首次采用压印工艺在凸球面玻璃表面制备了减反射结构。利用电子束直写和反应离子刻蚀技术，在具有凹面的碳化硅模具上制备了周期为250 nm的ARS倒置图案。在逐次电子束光刻过程中，样品表面高度沿模具曲率调整到电子束焦点位置。含ARS的印迹透镜在波长530 nm处的表面反射率为0.2%，球面误差小于500 nm。(C)2010年日本应用物理学会
For the first time, an antireflective structure (ARS) on a convex spherical glass surface was fabricated using an imprinting process. The inverted pattern of the ARS with a 250-nm period was fabricated on a SiC mold with a concave surface using electron beam (EB) direct writing and reactive ion etching. The sample surface height was adjusted to the EB focal position along the mold curvature during the step-and-repeat EB lithography. The imprinted lens with the ARS exhibited surface reflectance of 0.2% at a wavelength of 530 nm and a spherical error magnitude of less than 500 nm. (C) 2010 The Japan Society of Applied Physics