Plasma-etched neural probes
Plasma-etched neural probes
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DOI：
10.1016/s0924-4247(97)80221-x
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发表时间：
1997-01-01
影响因子：
4.6
通讯作者：
Kovacs, GTA
中科院分区：
文献类型：
--
作者：
Kewley, DT;Hills, MD;Kovacs, GTA
提出了一种用于神经生物学研究的硅基神经探针微加工的新方法。这种探针提供了独特的能力，可以同时记录来自神经组织内多个精确定义位置的高分辨率信号。制造过程利用等离子体蚀刻来定义探针轮廓，从而产生尖锐的尖端，并与标准CMOS工艺兼容。通过MOSIS服务制造了一个低噪声放大器阵列，以完成一个系统，该系统已在多个成功的生理实验中使用。
A new method is presented for microfabricating silicon-based neural probes that are designed for neurobiology research. Such probes provide unique capabilities to record high-resolution signals simultaneously from multiple, precisely defined locations within neural tissue, The fabrication process utilizes a plasma etch to define the probe outline, resulting in sharp tips and compatibility with standard CMOS processes, A low-noise amplifier array has been fabricated through the MOSIS service to complete a system that has been used in multiple successful physiological experiments.