Magnetic properties of Ni/Fe//SiO2 multilayer film
Magnetic properties of Ni/Fe//SiO2 multilayer film
复制标题
Ni/Fe//SiO2多层薄膜的磁性能
DOI：
10.1063/1.341320
复制
发表时间：
1988
期刊：
影响因子：
--
通讯作者：
Y. Nagai
中科院分区：
文献类型：
--
作者：
M. Senda;Y. Nagai
本文研究了离子束溅射Fe/SiO2多层膜的磁性。减少Fe层厚度，同时保持恒定的SiO2层厚度，导致良好的软磁性能和几乎为零的磁致伸缩。这些结果被认为是由于较小的晶粒和Fe层中的晶体取向的变化。在由7 nm Fe和2.5 nm SiO2层组成的Fe/SiO2多层膜中，在小于±10−6的磁致伸缩下实现了1.55 T的磁化强度、0.3 Oe的难轴磁导率和4000的相对磁导率。在250 °C退火后，相对磁导率增加到5000。此外，可以获得具有易磁化轴方向和适用于薄膜磁头的延伸180°壁的磁畴结构。
This paper discusses the magnetic properties of ion‐beam‐sputtered Fe/SiO2 multilayer films. Decreasing Fe layer thickness, while maintaining a constant SiO2 layer thickness, results in good soft‐magnetic properties and nearly zero magnetostriction. These results are thought to be due to smaller crystal grains and a change in crystal orientation in the Fe layers. In Fe/SiO2 multilayer films consisting of 7‐nm Fe and 2.5‐nm SiO2 layers, magnetization of 1.55‐T, hard‐axis coercivity of 0.3 Oe, and relative permeability of 4000 are achieved under magnetostriction of less than ±10−6. After 250 °C annealing, relative permeability increases up to 5000. Furthermore, a magnetic domain structure with easy‐axis direction and extended 180° walls suitable for thin‐film heads can be obtained.