Plasmonic field enhancement and SERS in the effective mode volume picture
Plasmonic field enhancement and SERS in the effective mode volume picture
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DOI：
10.1364/oe.14.001957
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发表时间：
2006-03-06
期刊：
影响因子：
3.8
通讯作者：
Maier, SA
中科院分区：
文献类型：
--
作者：
Maier, SA
通过有效电磁模体积V-eff的概念描述了通过金属/绝缘体/金属异质结构中的表面等离子体激元激发来控制纳米电磁场约束的产生。广泛用于介电微腔的描述，其扩展到等离子体提供了一个方便的品质因数，并允许与电介质同行进行比较。使用一维的分析模型和三维的时域有限差分模拟，它表明，等离子体谐振腔与纳米电介质间隙确实允许物理以及有效的模式体积远低于衍射极限的差距材料，尽管显着的能量渗透到金属。在这幅图中，物质-等离子体相互作用可以量化的质量因子Q和V-eff，使表面增强拉曼散射的谐振腔描述。(c)2006年美国光学学会。
The controlled creation of nanometric electromagnetic field confinement via surface plasmon polariton excitations in metal/insulator/metal heterostructures is described via the concept of an effective electromagnetic mode volume V-eff. Extensively used for the description of dielectric microcavities, its extension to plasmonics provides a convenient figure of merit and allows comparisons with dielectric counterparts. Using a one-dimensional analytical model and three-dimensional finite-difference time-domain simulations, it is shown that plasmonic cavities with nanometric dielectric gaps indeed allow for physical as well as effective mode volumes well below the diffraction limit in the gap material, despite significant energy penetration into the metal. In this picture, matter-plasmon interactions can be quantified in terms of quality factor Q and V-eff, enabling a resonant cavity description of surface enhanced Raman scattering. (c) 2006 Optical Society of America.