Protein Micro- and Nanopatterning Using Aminosilanes with Protein-Resistant Photolabile Protecting Groups
Protein Micro- and Nanopatterning Using Aminosilanes with Protein-Resistant Photolabile Protecting Groups
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DOI：
10.1021/ja1103662
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发表时间：
2011-03-02
影响因子：
15
通讯作者：
Micklefield, Jason
中科院分区：
文献类型：
--
作者：
Ahmad, Shahrul A. Alang;Wong, Lu Shin;Micklefield, Jason
描述了一种将纳米光刻与合成化学方法集成的方法，其中使用近场光学技术来选择性地脱保护由改性的2-硝基苯乙氧基羰基（NPEOC）基团保护的氨基硅烷的吸附形成的Alms。NPEOC基团在间位或对位用四乙二醇或七乙二醇加合物官能化。我们描述了这些生物抗性氨基硅烷的合成和所得的光反应性膜的表征。通过暴露于UV光（λ = 325 nm）的光脱保护以高效率产生胺，对于所有四种吸附物以相似的速率，并且在2.24 J cm（-2）的暴露后完成。在光脱保护之后，用三氟乙酸酐进行高效衍生化。使用掩模形成的微图案化的样品用生物素去官能化的聚合物纳米颗粒衍生化，并且在用生物素衍生化之后，用于形成抗生物素蛋白包被的聚合物颗粒的图案。荧光显微镜和原子力显微镜的数据表明，完整的保护基团赋予优异的抵抗非特异性：吸附。使用扫描近场光刻法创建纳米级图案，并用生物素衍生化。随后与抗生物素蛋白功能化的聚合物纳米颗粒的缀合产生了清晰的荧光图像，其指示与纳米结构的致密附着和周围表面上的优异的蛋白质抗性。这些简单的光可裂解的保护基团的策略，结合使用近场曝光，提供了良好的前景，在生物系统中的纳米分辨率的表面反应性的控制，并提供集成自上而下和自下而上的分子制造范例的承诺。
An approach to the integration of nanolithography with synthetic chemical methodology is described, in which near-field optical techniques are used to selectively deprotect alms formed by the adsorption of aminosilanes protected by modified 2-nitrophenylethoxycarbonyl (NPEOC) groups. The NPEOC groups are functionalized at the m- or p-position with either a tetraethyleneglycol or a heptaethylene glycol adduct. We describe the synthesis of these bioresistant aminosilanes and the characterization of the resulting photoreactive films. Photodeprotection by exposure to UV light (lambda = 325 nm) yielded the amine with high efficiency, at a similar rate for all four adsorbates, and was complete after an exposure of 2.24 J cm(-2). Following photodeprotection, derivatization by trifluoroacetic anhydride was carried out with high efficiency. Micropatterned samples, formed using a mask, were derivatized with aldehyde-functionalized polymer nanoparticles and, following derivatization with biotin, were used to form patterns of avidin-coated polymer particles. Fluorescence microscopy and atomic force microscopy data demonstrated that the intact protecting groups conferred excellent resistance to nonspecific: adsorption. Nanometer-scale patterns were created using scanning near-field photolithography and were derivatized with biotin. Subsequent conjugation with avidin-functionalized polymer nanoparticles yielded clear fluorescence images that indicated dense attachment to the nanostructures and excellent protein resistance on the surrounding surface. These simple photocleavable protecting group strategies, combined with the use of near-field exposure, offer excellent prospects for the control of surface reactivity at nanometer resolution in biological systems and offer Promise for integrating the top-down and bottom-up molecular fabrication paradigms.