Evidence of topological surface state in three-dimensional Dirac semimetal Cd3As2.
Evidence of topological surface state in three-dimensional Dirac semimetal Cd3As2.
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三维狄拉克半金属 Cd3As2 拓扑表面态的证据
DOI:
10.1038/srep06106
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发表时间:
2014-08-20
影响因子:
4.6
通讯作者:
Zhou XJ
中科院分区:
文献类型:
--
作者:
Yi H;Wang Z;Chen C;Shi Y;Feng Y;Liang A;Xie Z;He S;He J;Peng Y;Liu X;Liu Y;Zhao L;Liu G;Dong X;Zhang J;Nakatake M;Arita M;Shimada K;Namatame H;Taniguchi M;Xu Z;Chen C;Dai X;Fang Z;Zhou XJ
The three-dimensional topological semimetals represent a new quantum state of matter. Distinct from the surface state in the topological insulators that exhibits linear dispersion in two-dimensional momentum plane, the three-dimensional semimetals host bulk band dispersions linearly along all directions. In addition to the gapless points in the bulk, the three-dimensional Weyl/Dirac semimetals are also characterized by “topologically protected” surface state with Fermi arcs on their surface. While Cd3As2is proposed to be a viable candidate of a Dirac semimetal, more investigations are necessary to pin down its nature. In particular, the topological surface state, the hallmark of the three-dimensional semimetal, has not been observed in Cd3As2. Here we report the electronic structure of Cd3As2investigated by angle-resolved photoemission measurements on the (112) crystal surface and detailed band structure calculations. The measured Fermi surface and band structure show a good agreement with the band structure calculations with two bulk Dirac-like bands approaching the Fermi level and forming Dirac points near the Brillouin zone center. Moreover, the topological surface state with a linear dispersion approaching the Fermi level is identified for the first time. These results provide experimental indications on the nature of topologically non-trivial three-dimensional Dirac cones in Cd3As2.
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影响因子:
4.6
作者:
Feng Y;Wang Z;Chen C;Shi Y;Xie Z;Yi H;Liang A;He S;He J;Peng Y;Liu X;Liu Y;Zhao L;Liu G;Dong X;Zhang J;Chen C;Xu Z;Dai X;Fang Z;Zhou XJ
通讯作者:
Zhou XJ
影响因子:
3.7
作者:
Wang, Zhijun;Sun, Yan;Fang, Zhong
通讯作者:
Fang, Zhong
影响因子:
8.6
作者:
Borisenko, Sergey;Gibson, Quinn;Cava, Robert J.
通讯作者:
Cava, Robert J.
影响因子:
2.1
作者:
JAYGERIN, JP;AUBIN, MJ;CARON, LG
通讯作者:
CARON, LG
影响因子:
41.2
作者:
Liu, Z. K.;Jiang, J.;Chen, Y. L.
通讯作者:
Chen, Y. L.