Effects of second metal contents on microstructure and micro-hardness of ternary nitride films synthesized by cathodic arc method
Effects of second metal contents on microstructure and micro-hardness of ternary nitride films synthesized by cathodic arc method
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DOI：
10.1016/j.surfcoat.2004.08.033
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发表时间：
2004-11
影响因子：
5.4
通讯作者：
H. Hasegawa;Tetsuya Suzuki
中科院分区：
文献类型：
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作者：
H. Hasegawa;Tetsuya Suzuki
简要总结了Ti1−XAlXN、Ti1−XCrXN、Ti1−XZrXN、Cr1−XAlXN、Zr1−XAlXN和Ti1−XWXN等三元氮化膜的研究现状，重点分析了不同X值下的显微硬度。阴极电弧法是一种在稳定热力学条件下无法合成亚稳态三元薄膜的专门方法。三元薄膜的晶体结构和晶格参数随X值的变化而变化，其物理性质也相应发生变化。本文通过X射线衍射（XRD）、扫描电镜（SEM）和透射电镜（TEM）分析了特定X值的三元氮化膜的最大硬度。
Current status of ternary nitride films such as Ti1−XAlXN, Ti1−XCrXN, Ti1−XZrXN, Cr1−XAlXN, Zr1−XAlXN and Ti1−XWXN was briefly summarized focused on micro-hardness with respect to different X value. The cathodic arc method is a specialized method in creating metastable ternary films which cannot be synthesized under stable thermodynamic conditions. The crystal structure and lattice parameter of ternary films change with X value and their physical properties correspondingly change as well. In this paper, the maximum hardness of ternary nitride films with particular X value was discussed based on the phase transition, analyzed by X-ray diffraction (XRD) and scanning and transmission electron microscopy (SEM and TEM).