Ray tracing on extended hemispherical and elliptical silicon dielectric lenses
Ray tracing on extended hemispherical and elliptical silicon dielectric lenses
复制标题
扩展半球形和椭圆形硅介电透镜上的光线追踪
DOI：
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发表时间：
1995
期刊：
影响因子：
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通讯作者：
Z. L. Sun
中科院分区：
文献类型：
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作者：
W. Dou;Z. L. Sun
本文用光线追踪法比较了扩展的半球形和椭圆形硅介质透镜。文[1]指出，虽然椭圆透镜是由扩展的半球透镜合成的，但两个透镜的光学焦点并不在同一位置。这可以用来解释为什么如果馈电天线放置在2.2 mm到2.4 mm延伸长度之间的区域(对于直径13.7 mm的透镜，介电常数=11.7)，将获得对准、方向性和高斯耦合效率之间的最佳折衷。
In this paper, extended hemispherical and elliptical silicon dielectric lenses are compared by means of ray tracing. It is shown that the optical focuses of two lenses are not at same position though the elliptical lens is synthesized from an extended hemispherical lens by carefully choosing a particular extension length as stated in ref[1]. It may be used to explain why the best compromise between alignment, directivity and Gaussian-coupling effciency will be obtained if the feed antenna is placed at the region between 2.2 mm and 2.4 mm of extension length (for 13.7 mm diameter lens, dielectric contant = 11.7).