(Ti,W,Cr)B2 coatings produced by dc magnetron sputtering
(Ti,W,Cr)B2 coatings produced by dc magnetron sputtering
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DOI：
10.1016/j.tsf.2011.08.071
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发表时间：
2012-01-01
期刊：
影响因子：
2.1
通讯作者：
Schmidt, H.
中科院分区：
文献类型：
--
作者：
Newirkowez, A.;Cappi, B.;Schmidt, H.
通过直流磁控溅射复合靶，在硅衬底上沉积组成为（Ti0.44W0.29Cr0.27）B-1.90的过渡金属二硼化物涂层。靶的化学成分转移到溅射膜上。掠入射X射线衍射表明，所沉积的薄膜是非晶的。电子显微镜的研究表明，薄膜显示出柱状纳米结构。在1000摄氏度和1300摄氏度之间的温度下退火导致纳米晶体沉淀的形成，其可归因于（Ti，W，Cr）B-2、β-（W，Ti，Cr）B和W2 B4相。退火可用于调整沉淀物的平均晶粒尺寸，使这些膜成为通过纳米结构化增强的硬涂层的良好候选物。(c)2011 Elsevier B. V.保留所有权利。
Transition metal diboride coatings of composition (Ti0.44W0.29Cr0.27)B-1.90 were deposited on silicon sub-strates by dc magnetron sputtering of compound targets. The chemical composition of the targets is transferred to the sputtered films. The as-deposited films are amorphous as indicated by grazing incidence X-ray diffraction. Investigations with electron microscopy revealed that the films show a columnar nanostructure. Annealing at temperatures between 1000 degrees C and 1300 degrees C leads to the formation of nano-crystalline precipitations, which can be attributed to (Ti,W,Cr)B-2, beta-(W, Ti, Cr)B and W2B4 phases. Annealing can be used to tailor the average grain size of the precipitates, making these films a good candidate for hard coatings re-enforced by nano-structuring. (c) 2011 Elsevier B.V. All rights reserved.