Electrodeposition of Copper at Well-Defined Pt(111) and Rh(111) Electrodes in Sulfuric Acid Solutions: Studying with In Situ Scanning Tunneling Microscopy
Electrodeposition of Copper at Well-Defined Pt(111) and Rh(111) Electrodes in Sulfuric Acid Solutions: Studying with In Situ Scanning Tunneling Microscopy
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硫酸溶液中明确定义的 Pt(111) 和 Rh(111) 电极上的铜电沉积：用原位扫描隧道显微镜研究
DOI：
10.1021/la9912242
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发表时间：
2000
期刊：
影响因子：
--
通讯作者：
S. Yau
中科院分区：
文献类型：
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作者：
Zeli Wu;A. Zang;S. Yau
报道了在硫酸溶液中铜在有序的铂(111)和铑(111)电极上欠电位沉积(UPD)的原位扫描隧道显微镜(STM)结果。在0.05M H_2SO_4和5 mM CuSO_4中，铂(111)在1 mV/S下的循环伏安曲线在0.65和0.61V处有两个清晰的UPD峰，而Rh(111)在0.44V处有一个双峰。扫描隧道显微镜实时成像显示，Pt111的两个尖锐的UPD特征分别对应于(√3×√3)R30°结构的形成和无序相的形成。在沉积了完整的单层铜后，成像得到了长程有序的(√3×√7)斜结构，初步归属于位于铜附着层上的(双)硫酸盐阴离子。相反，一步在Rh(111)表面沉积了一层铜，其中(双)硫酸盐阴离子也积极参与了这一过程。在整个沉积过程中，原位扫描隧道显微镜显示出有序的(√3×√7)斜向结构，可能是由于共吸附的(双)硫酸盐阴离子所致。一系列..。
We report in situ scanning tunneling microscopy (STM) results of underpotential deposition (UPD) of copper at well-ordered Pt(111) and Rh(111) electrodes in sulfuric acid solutions. Cyclic voltammograms of Pt(111) at 1 mV/s in 0.05 M H2SO4 and 5 mM CuSO4 reveal two well-defined UPD peaks at 0.65 and 0.61 V, whereas one doublet UPD peak at 0.44 V is observed for Rh(111). Real-time STM imaging revealed that the two sharp UPD features for Pt(111) correspond to the formation of a (√3 × √3)R30° structure and a disorder phase, respectively. A long-range ordered (√3 × √7)oblique structure was imaged after a full monolayer of Cu was deposited, tentatively assigned to the (bi)sulfate anions lying atop the Cu adlayer. In contrast, a monolayer of Cu was deposited in a single step on Rh(111), where (bi)sulfate anions also actively participated in the process. In situ STM revealed a well-ordered (√3 × √7)oblique structure throughout the deposition process, likely because of the coadsorbed (bi)sulfate anions. A series ...