Comparative investigation of ELM control based on toroidal modelling of plasma response to RMP fields
Comparative investigation of ELM control based on toroidal modelling of plasma response to RMP fields
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基于等离子体对 RMP 场响应的环形模型的 ELM 控制比较研究
DOI：
10.1063/1.4978884
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发表时间：
2016-10
影响因子：
2.2
通讯作者：
Zhou Lina
中科院分区：
文献类型：
--
作者：
Liu Yueqiang;Kirk A.;Li Li;In Y.;Nazikian R.;Sun Youwen;Suttrop W.;Lyons B.;Ryan D.;Wang Shuo;Yang Xu;Zhou Lina
用于控制边缘局域模式 (ELM) 的等离子体对共振磁扰动场响应的广泛建模工作，有助于将边缘剥离响应识别为关键因素，这与在多个托卡马克装置（包括 MAST、ASDEX Upgrade、EAST 和 HL-2A）中观察到的 ELM 缓解相关。最近在 HL-2A 实验中观察到的 ELM 缓解的边缘安全系数窗口是用边缘剥离响应来解释的。在 ASDEX Upgrade 和 DIII-D 中，基于具有不同环形流假设的环形单流体电阻等离子体模型计算出的等离子体响应，在 ELM 抑制情况下通常比 ELM 缓解情况下更大。等离子体成形，特别是等离子体三角形，有助于增强等离子体响应。但成形似乎并不是唯一的因素——其他因素，例如（较高的）基座压力和/或电流也可能导致边缘剥离响应增加。
Extensive modelling efforts of the plasma response to the resonant magnetic perturbation fields, utilized for controlling the edge localized mode (ELM), help to identify the edge-peeling response as a key factor, which correlates to the observed ELM mitigation in several tokamak devices, including MAST, ASDEX Upgrade, EAST, and HL-2A. The recently observed edge safety factor window for ELM mitigation in HL-2A experiments is explained in terms of the edge-peeling response. The computed plasma response, based on toroidal single fluid resistive plasma model with different assumption of toroidal flows, is found generally larger in ELM suppressed cases as compared to that of the ELM mitigated cases, in ASDEX Upgrade and DIII-D. The plasma shaping, in particular, the plasma triangularity, contributes to the enhanced plasma response. But the shaping does not appear to be the sole factor-other factors such as the (higher) pedestal pressure and/or current can also lead to increased edge-peeling response.
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影响因子：
2.2
作者：
S. Haskey;M. Lanctot;Y. Liu;J. Hanson;B. Blackwell;R. Nazikian
通讯作者：
S. Haskey;M. Lanctot;Y. Liu;J. Hanson;B. Blackwell;R. Nazikian
影响因子：
3.3
作者：
A. Kirk;W. Suttrop;Yueqiang Liu;I. Chapman;P. Cahyna;T.Eich;C.Fuchs;C.Ham;J. Harrison
通讯作者：
A. Kirk;W. Suttrop;Yueqiang Liu;I. Chapman;P. Cahyna;T.Eich;C.Fuchs;C.Ham;J. Harrison
影响因子：
2.2
作者：
N. Ferraro
通讯作者：
N. Ferraro
影响因子：
2.2
作者：
Yueqiang Liu;A. Bondeson;C. Fransson;B. Lennartson;C. Breitholtz
通讯作者：
Yueqiang Liu;A. Bondeson;C. Fransson;B. Lennartson;C. Breitholtz
影响因子：
3.3
作者：
Yueqiang Liu;A. Kirk;Y. Gribov;M. Gryaznevich;T. Hender;E. Nardon
通讯作者：
Yueqiang Liu;A. Kirk;Y. Gribov;M. Gryaznevich;T. Hender;E. Nardon