ANALYSIS OF THICK BRAIN SECTIONS BY OBVERSE-REVERSE COMPUTER MICROSCOPY - APPLICATION OF A NEW, HIGH CLARITY GOLGI-NISSL STAIN
ANALYSIS OF THICK BRAIN SECTIONS BY OBVERSE-REVERSE COMPUTER MICROSCOPY - APPLICATION OF A NEW, HIGH CLARITY GOLGI-NISSL STAIN
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DOI：
10.1016/0165-0270(81)90045-5
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发表时间：
1981-01-01
影响因子：
3
通讯作者：
VANDERLOOS, H
中科院分区：
文献类型：
--
作者：
GLASER, EM;VANDERLOOS, H
通过光学显微镜使用油浸物镜对300 μ m厚的异常清晰的Golgi-Nissl切片[来自小鼠和大鼠脑]进行形态测定研究。清晰度结果从一个新的变化的染色程序，结合高尔基体和尼氏图像在1节。开发了一种观察技术，允许从其正面（或正常观察）和背面（或下方）检查组织学制备物。该技术被设计用于计算机显微镜，但也可用于任何载物台位置可在100 μ m内测量的光学显微镜。厚度大于300 μ m的部分可以根据物镜透镜的工作距离进行研究，只要材料的透明度允许。
Exceptionally clear Golgi-Nissl sections of 300 .mu.m thickness [from mouse and rat brain] were morphometrically studied by light microscopy using oil immersion objectives. The clarity results from a new variation of a staining procedure that combines Golgi and Nissl images in 1 section. A viewing technique was developed that permits a histologic preparation to be examined from its obverse (or normally viewed) side and its reverse (or under) side. The technique was designed for use with a computer microscope but can be employed with any light microscope whose stage position can be measured within 100 .mu.m. Sections thicker than 300 .mu.m can be studied dependent on the working distance of the objective lens, provided that the clarity of the material permits it.