Ni layer thickness dependence of the interface structures for Ti/Ni/Ti trilayer studied by X-ray standing waves.
Ni layer thickness dependence of the interface structures for Ti/Ni/Ti trilayer studied by X-ray standing waves.
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DOI：
10.1021/am3024614
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发表时间：
2013-01
影响因子：
9.5
通讯作者：
Wenbin Li;Jingtao Zhu;Haochuan Li;Zhong Zhang;Xiaoying Ma;Xiaoyue Yang;Hongchang Wang;Zhanshan Wang
中科院分区：
文献类型：
--
作者：
Wenbin Li;Jingtao Zhu;Haochuan Li;Zhong Zhang;Xiaoying Ma;Xiaoyue Yang;Hongchang Wang;Zhanshan Wang
利用周期性多层膜产生的X射线驻波，基于X射线反射率（XRR）和掠入射X射线荧光（GIXRF）方法研究了Ti/Ni/Ti三层膜的界面微结构。对于厚度为1.7 nm的Ni层，观察到Ti-on-Ni界面的粗糙度为0.64 nm，Ni-on-Ti界面的粗糙度为0.40 nm，这可以通过当Ni层厚度处于非晶到结晶过渡区域时由Ni微晶的成核引起的Ti-on-Ni界面上的额外粗糙度来解释。对于超过该过渡区域的3.3 nm的Ni层厚度，Ti-on-Ni界面的粗糙度为0.42 nm，Ni-on-Ti界面的粗糙度为0.46 nm，这与润湿和去润湿条件的预期一致。
X-ray standing waves generated by periodic multilayers have been used to characterize the interface microstructures of Ti/Ni/Ti trilayers based on the X-ray reflectivity (XRR) and grazing incidence X-ray fluorescence (GIXRF) methods. For the Ni layer having thickness of 1.7 nm, it is observed that the roughness of Ti-on-Ni interface is 0.64 nm and that of Ni-on-Ti interface is 0.40 nm, which can be explained by an additional roughness on the Ti-on-Ni interface induced by the nucleation of Ni crystallites when the Ni layer thickness is at the amorphous-to-crystalline transition region. For the Ni layer thickness of 3.3 nm beyond this transition region, the roughness of Ti-on-Ni interface is 0.42 nm and Ni-on-Ti interface is 0.46 nm, which is consistent with the expectation on wetting and dewetting conditions.