Ce10[Si10O9N17]Br, Nd10[Si10O9N17]Br and Nd10[Si10O9N17]Cl oxonitridosilicate halides with a new layered structure type
Ce10[Si10O9N17]Br, Nd10[Si10O9N17]Br and Nd10[Si10O9N17]Cl oxonitridosilicate halides with a new layered structure type
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DOI:
10.1016/j.jssc.2005.08.010
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发表时间:
2005-11
影响因子:
3.3
通讯作者:
A. Lieb;W. Schnick
中科院分区:
文献类型:
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作者:
A. Lieb;W. Schnick
The isotypic oxonitridosilicate halides Ce{sub 1}[Si{sub 1}O{sub 9}N{sub 17}]Br, Nd{sub 1}[Si{sub 1}O{sub 9}N{sub 17}]Br and Nd{sub 1}[Si{sub 1}O{sub 9}N{sub 17}]Cl were obtained by the reaction of the respective lanthanide metals, their oxides and halides with 'Si(NH){sub 2}' in a radiofrequency furnace at temperatures around 1800 deg. C, using CsBr, resp. CsCl, as a flux. The crystal structures were determined by single-crystal X-ray diffraction (Pbam, no. 55, Z=2; Ce/Br: a=10.6117(9) A, b=11.2319(10) A, c=11.688(8) A, R1=0.0356; Nd/Br: a=10.523(2) A, b=11.101(2) A, c=11.546(2) A, R1=0.0239; Nd/Cl: a=10.534(2) A, b=11.109(2) A, c=11.543(2) A, R1=0.0253) and represent a new layered structure type. The structure refinements were performed utilizing an O/N-distribution model according to Paulings rules, i.e. nitrogen was positioned on all bridging sites and mixed O/N-occupation was assumed on the terminal sites resulting in charge neutrality of the compounds. The layers consist of condensed [SiN{sub 2}(O/N){sub 2}] and [SiN{sub 3}(O/N)] tetrahedra of Q{sup 2} and Q{sup 3} type. The chemical composition of the compounds was derived from chemical analyses for Nd{sub 1}[Si{sub 1}O{sub 9}N{sub 17}]Br and electron probe micro analyses (EPMA) for all three compounds. The results of IR spectroscopic investigations are reported.