Dynamic Behavior of Carbon Deposited on Tungsten Surface due to Carbon Ion Bombardment and Its Influence on Ion–Solid Interactions
Dynamic Behavior of Carbon Deposited on Tungsten Surface due to Carbon Ion Bombardment and Its Influence on Ion–Solid Interactions
复制标题
碳离子轰击沉积在钨表面的碳的动态行为及其对离子-固体相互作用的影响
DOI：
10.1143/jjap.42.5259
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发表时间：
2003
期刊：
影响因子：
--
通讯作者：
K. Ohya
中科院分区：
文献类型：
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作者：
Retsuo Kawakami;K. Ohya
用动态蒙特卡罗程序EDDY研究了C离子轰击W表面后C的注量演化及其对离子-固体相互作用（如物理溅射和离子反射）的影响。特别是，注意力集中在他们的影响能源的依赖。在代码中，由于碰撞混合导致的离子的影响，也由于热激活扩散的沉积的C导致的表面温度升高的表面成分的变化的注量演化模拟沿着与粒子发射从C污染的W表面。沉积的C的物理溅射被表面附近的反射散射碰撞增强，这是由于C离子从C和W的反射之间的差异造成的。物理溅射的能量依赖性取决于注量。随着能量的增加，物理溅射增强，然后在高于一定的冲击能量时被抑制，该冲击能量取决于注量而变化。这是由于在低能量密度下形成的C和W的混合层与在高能量密度下在W表面上形成的C膜之间的差异造成的。此外，其表面温度依赖性强烈依赖于注量。对于低能量密度的物理溅射被抑制与表面温度的增加，而它是增强了高能量密度。这是由于由于沉积的C的扩散引起的混合层的显著生长。
The fluence evolution of C deposited on a W surface due to C ion impact and its influence on ion–solid interactions such as physical sputtering and ion reflection are studied using a dynamic Monte Carlo code, EDDY. In particular, attention is focused on their impact energy dependence. In the code, the fluence evolution of surface composition changes due to collisional mixing resulting from the ion impact and also due to thermal activated diffusion of the deposited C resulting from the elevated surface temperature is simulated along with the particle emissions from the C-contaminated W surface. The physical sputtering of the deposited C is enhanced by the reflective scattering collision in the vicinity of the surface, which results from a difference between the C ion reflection from C and that from W. The energy dependence of the physical sputtering is dependent upon the fluence amount. As the energy increases, the physical sputtering is enhanced, and it is then suppressed above a certain impact energy which varies depending on the fluence amount. This results from the difference between a mixed layer of C and W formed at a low fluence and a C film formed on the W surface at a high fluence. In addition, its surface temperature dependence is strongly dependent upon the fluence amount. For a low fluence the physical sputtering is suppressed with increasing surface temperature, whereas it is enhanced for a high fluence. This is attributed to a remarkable growth of the mixed layer due to the diffusion of the deposited C.