Impedance matching for optimization of power transfer in a capacitively excited RF plasma reactor
Impedance matching for optimization of power transfer in a capacitively excited RF plasma reactor
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用于优化电容激发射频等离子体反应器中功率传输的阻抗匹配
DOI：
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发表时间：
1998
期刊：
影响因子：
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通讯作者：
B. Held
中科院分区：
文献类型：
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作者：
M. Salem;J. Loiseau;B. Held
在RF冷等离子体反应器中，从发生器到放电的能量传递并不完美，只有50%至70%（甚至更少）的功率有效地传输到放电，剩余部分主要消耗在匹配网络中。因此，该电路的选择是优化从电源到等离子体的能量传输的最重要因素。两个经典的网络，型和L型，分析研究了它们与实验装置的相互作用。从这项研究中，在这两种情况下，推导出线圈电感的数值，并确定电容器的电容范围。在40-200 mTorr的压力范围和13.56 MHz的氩等离子体中，用两种类型的匹配网络进行的实验研究导致与L型的更有效的能量传递，必须选择L型以提高用RF等离子体反应器进行表面处理（例如溅射或蚀刻）的能量产率。
In RF cold plasma reactors, energy transfer from the generator to the discharge is not perfect and only 50 to 70 percent (or even less) of the power is effectively transmitted to the discharge, the reMayning part being mostly dissipated in the matching network. The choice of this circuit is therefore the most important factor in view to optimize the energy transfer from the power supply to the plasma. Two classical networks, Π - and L -type, are analytically studied in their interaction with the experimental device. From this study, in both cases, numerical values are deduced for the coil inductance, and a capacitance range is determined for the capacitors. An experimental study in argon plasma at pressure range of 40-200 mTorr and at 13.56 MHz, performed with the two types of matching networks leads to a much effective energy transfer with the L -type, which must be chosen in order to improve the energetic yield of surface processing (sputtering or etching for instance) with a RF plasma reactor.