Highly Sensitive Formation of Stable Surface Relief Structures in Bisanthracene Films with Spatially Patterned Photopolymerization
Highly Sensitive Formation of Stable Surface Relief Structures in Bisanthracene Films with Spatially Patterned Photopolymerization
复制标题
利用空间图案化光聚合在双蒽薄膜中高灵敏地形成稳定的表面浮雕结构
DOI：
10.1021/acsami.6b07943
复制
发表时间：
2016
影响因子：
9.5
通讯作者：
Hideyuki Kihara
中科院分区：
文献类型：
--
作者：
Takashi Ubukata;Megumi Nakayama;Taishi Sonoda;Yasushi Yokoyama;Hideyuki Kihara
一种简便的方法，用于制造一个高灵敏度的表面浮雕的证明，它的工作原理上的空间图案化的光致聚合诱导的质量传输在一系列的双蒽化合物的非晶薄膜。由于双蒽的聚合，所得无色透明浮雕结构的稳定性显著提高。
A facile method for the fabrication of a highly sensitive surface relief is demonstrated, which operates on the principle of spatially patterned photopolymerization-induced mass transport in the amorphous films of a series of bisanthracene compounds. The stability of the resultant colorless transparent relief structure is dramatically improved owing to the polymerization of the bisanthracene.