Longitudinal painting with large amplitude second harmonic rf voltages in the rapid cycling synchrotron of the Japan Proton Accelerator Research Complex
Longitudinal painting with large amplitude second harmonic rf voltages in the rapid cycling synchrotron of the Japan Proton Accelerator Research Complex
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DOI：
10.1103/physrevstab.12.041001
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发表时间：
2009-04
影响因子：
--
通讯作者：
F. Tamura;Masanobu Yamamoto;M. Yoshii;C. Ohmori;M. Nomura;A. Schnase;M. Toda;H. Suzuki;T. Shima
中科院分区：
文献类型：
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作者：
F. Tamura;Masanobu Yamamoto;M. Yoshii;C. Ohmori;M. Nomura;A. Schnase;M. Toda;H. Suzuki;T. Shima
在日本质子加速器研究综合体（J-PARC）的快循环同步加速器（RCS）中，纵向涂敷是减轻空间电荷效应的重要措施。已知的是，动量偏移注入和施加二次谐波射频电压改善了聚束因子，聚束因子被定义为平均电流与峰值电流的比率。我们的模拟研究表明，大幅度的二次谐波，80%的基本，是最佳的，和二次谐波相位扫描改善聚束因子在注入周期的开始。我们在J-PARC RCS上进行了纵向涂装的束流试验。我们证明了纵向绘画与80%的二次谐波，$\ensuremath{-} 0.2%$的动量偏移，和二次谐波相位扫描改善聚束因子显着。
In the rapid cycling synchrotron (RCS) of the Japan Proton Accelerator Research Complex (J-PARC), the longitudinal painting is important to alleviate the space-charge effects. It is known that the momentum offset injection and applying the second harmonic rf voltage improves the bunching factor, which is defined as the ratio of average and peak current. Our simulation studies show that the large-amplitude second harmonic, 80% to the fundamental, is optimum, and the second harmonic phase sweep improves the bunching factor at the beginning of the injection period. We performed the beam tests of longitudinal painting in the J-PARC RCS. We proved that the longitudinal painting with the 80% second harmonic, the momentum offset of $\ensuremath{-}0.2%$, and the second harmonic phase sweep improved bunching factors significantly.