Surface potential measurement using a rotating dynamic capacitor
Surface potential measurement using a rotating dynamic capacitor
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使用旋转动态电容器测量表面电位
DOI：
10.1088/0022-3735/4/7/011
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发表时间：
1971
期刊：
影响因子：
--
通讯作者：
W. Farvis
中科院分区：
文献类型：
--
作者：
J. C. Mitchinson;R. D. Pringle;W. Farvis
介绍了一种适用于特高压的表面电位测量方法的理论和实践。该方法包括一个旋转的动态电容器，它允许在真空蒸发和沉积期间连续测量金属表面之间的接触电位差。对旋转型和振动型动态电容器进行了理论比较。
The theory and practice of a method of measuring surface potential which is suitable for use in u.h.v. is described. The method involves a rotating dynamic capacitor which permits continuous measurement of the contact potential difference between metal surfaces during vacuum evaporation and deposition. A theoretical comparison is made between the rotating and vibrating types of dynamic capacitor.