Ultra-narrow emission from single GaAs self-assembled quantum dots grown by droplet epitaxy

Ultra-narrow emission from single GaAs self-assembled quantum dots grown by droplet epitaxy
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DOI:
10.1088/0957-4484/20/39/395601
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发表时间:
2009-09-30
期刊:
影响因子:
3.5
通讯作者:
Gurioli, M.
Gurioli, M.
中科院分区:
材料科学3区
文献类型:
--
作者:
Mano, T.;Abbarchi, M.;Gurioli, M.

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我们用改进的液滴外延技术生长了单个的GaAs/AlGaAs量子点,实现了超窄的激子发射。我们发现,未封顶的量子点可以在400℃的温度下进行热处理,而它们的形态没有太大的变化,因此能够在该温度下生长AlGaAs盖层。因此,我们证明,与传统的液滴外延量子点相比,发射的线宽减少了四倍,复合寿命增加了。用显微光致发光方法测得单个量子点上中性激子的平均线宽约为35微米eV。
We realized ultra-narrow excitonic emission from single GaAs/AlGaAs quantum dots (QDs) grown by a refined droplet epitaxy technique. We found that uncapped quantum dots can be annealed at 400 degrees C without major changes in their morphology, thus enabling an AlGaAs capping layer to be grown at that temperature. Consequently, we demonstrate a fourfold reduction of the linewidth of the emission together with an increased recombination lifetime, compared to the conventional droplet epitaxial QDs. The averaged linewidth of neutral excitons measured by micro-photoluminescence on single quantum dots was around 35 mu eV.