Recommendations of CCL/WG-N on: Realization of the SI metre using silicon lattice parameter and x-ray interferometry for nanometre and sub-nanometre scale applications in dimensional nanometrology
Recommendations of CCL/WG-N on: Realization of the SI metre using silicon lattice parameter and x-ray interferometry for nanometre and sub-nanometre scale applications in dimensional nanometrology
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CCL/WG-N 关于以下方面的建议： 使用硅晶格参数和 X 射线干涉测量技术实现 SI 米，用于三维纳米计量学中的纳米和亚纳米尺度应用
DOI：
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发表时间：
2022
期刊：
影响因子：
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通讯作者：
R. Dixson
中科院分区：
文献类型：
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作者：
A. Yacoot;H. Bosse;R. Dixson
导致第三薄片的位移。在使用中，干涉仪被对准，使得准直的X射线以衍射平面的布拉格角入射到分束器薄片（B）上，并从第一薄片（B）衍射。产生入射在第二薄片（M）上的两个衍射光束，从第二薄片（M）又出现两对衍射光束。来自每对的向内指向的光束在第三薄片（A）处重新组合。这两个光束的组合导致干涉图案的周期性取决于X射线从其衍射的晶格参数，即公差晶格的晶格参数
results in displacement of the third lamella. In use the interferometer is aligned so that collimated x-rays are incident on the Beam-splitter lamella (B) at the Bragg angle for the diffracting planes and diffracted from the first lamella (B). Two diffracted beams are produced which are incident on the second lamella (M), from which two more pairs of diffracted beams emerge. The inward pointing beams from each pair recombine at the third lamella (A). The combination of these two beams results in an interference pattern periodicity is by the lattice parameter of the from which the x-rays have been diffracted, i.e. of the of that lattice of tolerances