Creating defined 3-D defects inside an opaline Ormocerg® matrix with two-photon lithography
Creating defined 3-D defects inside an opaline Ormocerg® matrix with two-photon lithography
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DOI：
10.1002/marc.200600879
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发表时间：
2007-04-16
影响因子：
4.6
通讯作者：
Zentel, Rudolf
中科院分区：
文献类型：
--
作者：
Lange, Birger;Jhaveri, Shalin J.;Zentel, Rudolf
在合成蛋白石内创建明确的结构是光学应用的关键一步，在光学中控制光在光子晶体内的传播是必要的。在之前的一篇论文中，我们描述了 Ormocer (R) 的纳米结构以形成反蛋白石（Lange 等人，Macromol. Rapid Commun. 2006,27,1746）。在这里，我们报告了这种强大的复制过程的应用，其中可以通过双光子光刻在 PC 内直接产生缺陷。首先用折射率相似的树脂填充反蛋白石结构的孔。在这种透明材料中，可以通过双光子光刻在指定位置引发聚合。除去未聚合的树脂后，发现了尺寸与复制品的重复单元相当的埋藏荧光缺陷。它们的发射波长可以根据复制品的带隙进行调整。
The creation of defined structures inside a synthetic opal is a key step toward applications in optics, where control of the propagation of light inside a photonic crystal is necessary. In a previous paper, we described the nanostructuring of Ormocer (R) to form inverse opals (Lange et al., Macromol. Rapid Commun. 2006,27,1746). Here, we report an application for this robust replica process in which defects can be directly produced within the PC by two-photon lithography. The holes of an inverse opal structure are first filled with a resin of similar refractive index. In this transparent material, polymerization can be initiated at defined places via two-photon lithography. After removal of the unpolymerized resin, buried fluorescent defects of dimensions comparable to the repeating units of the replica are found. The wavelength of their emission can be adjusted to the band gap of the replica.