Development of high-throughput, high-damage-threshold beam separator for 13 nm high-order harmonics.
Development of high-throughput, high-damage-threshold beam separator for 13 nm high-order harmonics.
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DOI：
10.1364/ol.31.001316
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发表时间：
2006-05
期刊：
影响因子：
3.6
通讯作者：
Y. Nagata;Y. Nabekawa;K. Midorikawa
中科院分区：
文献类型：
--
作者：
Y. Nagata;Y. Nabekawa;K. Midorikawa
我们展示了一种波长短于 30 nm 的高通量、高损伤阈值光束分离器，它使用在 Si 基板上制备的 10 nm 厚的铌氮薄膜，并设置为相对于泵浦波长的布儒斯特角。该薄膜通过射频反应磁控溅射沉积在硅衬底上。对于 26 fs 泵浦脉冲，光束分离器的衰减率为 0.01，损伤阈值强度至少为 0.8 TW/cm2。测得分束器的反射率在13-18 nm波长范围内超过70%。这种宽带光束分离器可用于消除来自纵向泵浦 X 射线激光器以及高阶谐波的高能激光脉冲。
We demonstrate a high-throughput, high-damage-threshold beam separator for wavelengths shorter than 30 nm, which uses a 10 nm thick niobium nitrogen film prepared on a Si substrate, set at the Brewster angle relative to the pump wavelength. The film was deposited by rf reactive magnetron sputtering on a Si substrate. The beam separator has an attenuation ratio of 0.01 and a damage-threshold intensity of at least 0.8 TW/cm2 for a 26 fs pump pulse. The measured reflectivity of the beam separator exceeded 70% in a wavelength range of 13-18 nm. This broadband beam separator may be used to eliminate energetic laser pulses from longitudinally pumped x ray lasers as well as from high-order harmonics.