Mass spectrometric study on inactivation mechanism of spore-forming bacteria by low-pressure surface-wave excited oxygen plasma
Mass spectrometric study on inactivation mechanism of spore-forming bacteria by low-pressure surface-wave excited oxygen plasma
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DOI：
10.1063/1.3588036
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发表时间：
2011-05
影响因子：
4
通讯作者：
Ying Zhao;A. Ogino;M. Nagatsu
中科院分区：
文献类型：
--
作者：
Ying Zhao;A. Ogino;M. Nagatsu
本文采用四极杆质谱法研究了氧等离子体对孢子形成菌的腐蚀现象。通过多离子检测，可以明显检测到氧等离子体辐照过程中H2O和CO2的蚀刻副产物。在三种不同的微波功率下，在几乎相同的还原孢子形状下，实现了大约106个孢子种群的失活。从目前的结果来看，氧自由基蚀刻只会对孢子萌发所不可避免的位于内膜的发芽受体造成损伤，而不会对核内的DNA造成损伤。
In this letter, the etching phenomena of the spore-forming bacteria by oxygen plasma were investigated by using quadrupole mass spectrometry. The etching by-products of H2O and CO2 were obviously detected during the oxygen plasma irradiation by the multiple ion detection measurement. Inactivation of roughly 106 spores population was achieved under almost the same reduced spore shapes for three different incident microwave powers. It is considered from the present results that the oxygen radical etching could cause damage to the germinant receptors located in the inner membrane inevitable for germination of spores, without any damage of the DNA in the cores.