In situ depth measurements for GD-OESPresented at the 2003 European Winter Conference on Plasma Spectrochemistry, Garmisch-Partenkirchen, Germany, January 12?17, 2003.
In situ depth measurements for GD-OESPresented at the 2003 European Winter Conference on Plasma Spectrochemistry, Garmisch-Partenkirchen, Germany, January 12?17, 2003.
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GD-OESP 的原位深度测量于 2003 年 1 月 12 日至 17 日在德国加米施-帕滕基兴举行的 2003 年欧洲冬季等离子体光谱化学会议上发表。
DOI：
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发表时间：
2003
期刊：
影响因子：
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通讯作者：
K. Wetzig
中科院分区：
文献类型：
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作者：
L. Wilken;V. Hoffmann;K. Wetzig
对于辉光放电源，我们提出了一种新的仪器来测量溅射过程中的深度。所开发的系统是基于激光干涉仪和格林型GD源。我们建立了一个数学模型，该模型校正了由于GD源和样品表面的热膨胀引起的信号干扰。另一个模型描述了样品表面温度对放电功率、材料常数和位置的依赖性。原位深度测量仪用于测量微米范围内的锌层厚度。
For a glow discharge source we present a new instrument to measure the depth during sputtering. The developed system is based on a laser interferometer and a Grimm type GD source. We developed a mathematical model, which corrects the signal disturbances due to the thermal expansion of GD source and sample surface. Another model describes dependence of the sample surface temperature on discharge power, material constants and position. The in situ depth measurement instrument is used to measure the thickness of zinc layers in the micrometer range.