M.Ishikawa: "DEPOSITION OF SILICON OXIDE FILMS ON POLYMER USING %)Hz PLASMA CVD" Proc.of the 10th symposium on plasma processing. Vol.10. 467-470 (1993)

M.Ishikawa: "DEPOSITION OF SILICON OXIDE FILMS ON POLYMER USING %)Hz PLASMA CVD" Proc.of the 10th symposium on plasma processing. Vol.10. 467-470 (1993)
复制标题

石川先生:%20"DEPOSITION%20OF%20SILICON%20OXIDE%20FILMS%20ON%20POLYMER%20USING%20%)Hz%20PLASMA%20CVD"%20Proc.of%20the%2010th%20symposium%20on%20plasma%20processing.%

DOI:
--
复制
发表时间:
--
期刊:
影响因子:
--
通讯作者:
--
中科院分区:
--
文献类型:
--
作者:

文献摘要

相似文献