Statistical characterization of thermally evaporated rough CaF2 films.
Statistical characterization of thermally evaporated rough CaF2 films.
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热蒸发粗糙 CaF2 薄膜的统计特征。
DOI：
10.1103/physreve.70.051606
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发表时间：
2004
期刊：
影响因子：
--
通讯作者：
R. Hallock
中科院分区：
文献类型：
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作者：
D. Luhman;R. Hallock
将CaF 2热沉积到玻璃衬底上产生纳米级粗糙表面。一系列的样品具有不同的标称CaF 2膜厚度已被制造，并已使用原子力显微镜的拓扑结构进行了研究。测量值的样品的统计特性，包括指数描述的缩放行为的表面。我们发现粗糙度指数α =0.88+/-0.03，生长指数β =0.75+/-0.03，动力学指数z= α/β =1.17+/-0.06。我们还测量了多重分形谱和最近邻高度差概率分布。结果是一致的噪声占主导地位的幂律分布与指数μ +1约等于4.6。使用轮廓仪测量来确定沉积膜的孔隙率，我们发现对于所有膜厚度，孔隙率是恒定的，其中Φ约为0.46。
Thermal deposition of CaF2 onto a glass substrate creates a nanoscale rough surface. A series of samples with differing nominal CaF2 film thicknesses have been fabricated, and the topography has been investigated using atomic force microscopy. Measured values for the statistical characterization of the samples are presented including the exponents describing the scaling behavior of the surfaces. We find that the roughness exponent alpha=0.88+/-0.03 , the growth exponent beta=0.75+/-0.03 , and the dynamical exponent z=alpha/beta=1.17+/-0.06 . We also measure the multifractal spectra and nearest neighbor height difference probability distribution. The results are consistent with noise dominated by a power-law distribution with exponent mu+1 approximately equal to 4.6. Profilometer measurements were used to determine the porosity phi of the deposited films, which we find to be constant for all film thicknesses with phi approximately 0.46 .