Microstructured ZnO photoelectrode grown on the sputter-deposited ZnO passivating-layer for improving the photovoltaic performances
Microstructured ZnO photoelectrode grown on the sputter-deposited ZnO passivating-layer for improving the photovoltaic performances
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DOI:
10.1016/j.matchemphys.2010.07.052
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发表时间:
2010-12
影响因子:
4.6
通讯作者:
Md. Faruk Hossain;T. Takahashi
中科院分区:
文献类型:
--
作者:
Md. Faruk Hossain;T. Takahashi
The aim of this work is to improve the photovoltaic performance of dye-sensitized solar cell (DSC) using a thin ZnO passivating-layer and micro-disc/ring structured ZnO photoelectrodes. A thin ZnO passivating-layer is prepared on the SnO2:F (FTO) substrate by facing-target sputtering technique, which prevents the short-circuit in DSC, and back-transfer of electron due to the direct-contact between the electrolyte, and the FTO substrate. Microstructured ZnO photoelectrodes are successfully grown on thin ZnO passivating-layer by a simple sol–gel process without and with 0.5, 1.0, 1.5, 2.0g of polyethylene glycol (PEG) contents. The micro-disc/ring structured ZnO films have confirmed by field-emission secondary electron and atomic force microscopes. The DSC has assembled using ruthenium-based dye, microstructured ZnO films, KI/I2-based electrolyte, and carbon counter-electrode. The photovoltage and the fill factor of DSCs have improved due to the presence of the ZnO passivating-layer. The photocurrent, photovoltage, and the photoelectric conversion efficiency of DSC increase with the increase of PEG contents. The DSC based on ZnO films prepared with 2.0g of PEG shows the maximum efficiency of 1.83%, photovoltage of 463mV, and photocurrent of 7.2mAcm−2in 100mWcm−2light intensity.