A micro-optical modulation spectroscopy technique for local strain measurement.
A micro-optical modulation spectroscopy technique for local strain measurement.
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用于局部应变测量的微光调制光谱技术。
DOI：
10.1063/1.3569764
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发表时间：
2011
期刊：
影响因子：
--
通讯作者：
Patrick Vincent Kelly
中科院分区：
文献类型：
--
作者：
H. Chouaib;Martin Edward Murtagh;Patrick Vincent Kelly
我们提供了一种高通量的方法来执行光学调制光谱，例如光反射或其他光谱技术，包括在10μm量级的微米分辨率的光致发光。该光谱技术是为硅片中的工艺引起的应变而设计的。使用偏振分束器与单个菲涅耳菱体相结合来优化光学系统，以提供具有最小光学损失的反射探测光束的最佳分离。此外，还使用了快速检测系统，可以在几秒钟内获得光谱。
We provide a high throughput method of performing optical modulation spectroscopy, such as photoreflectance or other spectroscopy techniques which include photoluminescence on a micrometric resolution scale of the order of 10 μm. The spectroscopic technique is designed for strain induced by process in silicon wafers. The optical system is optimized using a polarizing beamsplitter in conjunction with a single Fresnel rhomb for the provision of an optimum separation of the reflected probe beam with minimal optical losses. In addition, a rapid detection system is used that allows the spectrum to be acquired within few seconds.