Large-area fabrication of TiN nanoantenna arrays for refractory plasmonics in the mid-infrared by femtosecond direct laser writing and interference lithography [Invited]
Large-area fabrication of TiN nanoantenna arrays for refractory plasmonics in the mid-infrared by femtosecond direct laser writing and interference lithography [Invited]
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DOI：
10.1364/ome.5.002625
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发表时间：
2015-11
影响因子：
2.8
通讯作者：
Shahin Bagheri;Christine M. Zgrabik;T. Gissibl;Andreas Tittl;F. Sterl;Ramon Walter;S. D. Zuani;A. Berrier;T. Stauden;G. Richter;E. Hu;H. Giessen
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文献类型：
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作者：
Shahin Bagheri;Christine M. Zgrabik;T. Gissibl;Andreas Tittl;F. Sterl;Ramon Walter;S. D. Zuani;A. Berrier;T. Stauden;G. Richter;E. Hu;H. Giessen
坚固的中红外等离子体纳米天线是从热成像到能量转换等各种纳米光子应用的重要组成部分。氮化钛（TiN）由于其高的热稳定性和金属特性而成为这类材料的理想选择。在这里，我们采用直接激光写入和干涉光刻技术在蓝宝石和硅衬底上制造大面积的TiN纳米天线阵列。我们的光刻工具允许在聚合物层上快速均匀地制备纳米天线几何形状，然后通过随后的氩离子束蚀刻和化学湿蚀刻工艺选择性地将其转移到TiN上。天线由额外的Al2O3层保护，该层允许在氩气流中高温退火而不会损失等离子体特性。TiN天线几何形状的剪裁使等离子体共振从近红外到中红外光谱范围的精确调谐成为可能。由于TiN的优势特性与我们的多功能大面积和低成本制造工艺相结合，这种耐火纳米天线将在未来实现大量的高温等离子体应用，如热光伏。
Robust plasmonic nanoantennas at mid-infrared wavelengths are essential components for a variety of nanophotonic applications ranging from thermography to energy conversion. Titanium nitride (TiN) is a promising candidate for such cases due to its high thermal stability and metallic character. Here, we employ direct laser writing as well as interference lithography to fabricate large-area nanoantenna arrays of TiN on sapphire and silicon substrates. Our lithographic tools allow for fast and homogeneous preparation of nanoantenna geometries on a polymer layer, which is then selectively transferred to TiN by subsequent argon ion beam etching followed by a chemical wet etching process. The antennas are protected by an additional Al2O3 layer which allows for high-temperature annealing in argon flow without loss of the plasmonic properties. Tailoring of the TiN antenna geometry enables precise tuning of the plasmon resonances from the near to the mid-infrared spectral range. Due to the advantageous properties of TiN combined with our versatile large-area and low-cost fabrication process, such refractory nanoantennas will enable a multitude of high-temperature plasmonic applications such as thermophotovoltaics in the future.