Measuring and modeling the proximity effect in direct-write electron-beam lithography kinoforms.
Measuring and modeling the proximity effect in direct-write electron-beam lithography kinoforms.
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DOI：
10.1364/ao.34.000897
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发表时间：
1995-02
期刊：
影响因子：
1.9
通讯作者：
Fredrik Nikolajeff;Jörgen Bengtsson;Michael Larsson;M. Ekberg;S. Hård
中科院分区：
文献类型：
--
作者：
Fredrik Nikolajeff;Jörgen Bengtsson;Michael Larsson;M. Ekberg;S. Hård
The proximity effect in successively developed direct-write electron-beam lithography gratings is measured. The grating relief shapes are obtained from the measured power in several of the gratings' diffraction orders. Describing the proximity effect by a convolution with a double Gaussian point-spread function, we determine the parameters of the point-spread function. The writing part of the point-spread function is found to increase significantly with increasing development time, the background part much less.
