Effects of Ar pressure on ion flux energy distribution and ion fraction in r.f.-plasma-assisted magnetron sputtering
Effects of Ar pressure on ion flux energy distribution and ion fraction in r.f.-plasma-assisted magnetron sputtering
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射频等离子体辅助磁控溅射中氩气压力对离子通量能量分布和离子分数的影响
DOI:
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发表时间:
1999
期刊:
影响因子:
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通讯作者:
A. Kinbara
中科院分区:
文献类型:
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作者:
E. Kusano;Kazuhiro Fukushima;Takayoshi Saitoh;Suguru Saiki;N. Kikuchi;H. Nanto;A. Kinbara