MAX phase formation by intercalation upon annealing of TiCx/Al (0.4 ≤ x ≤ 1) bilayer thin films
MAX phase formation by intercalation upon annealing of TiCx/Al (0.4 ≤ x ≤ 1) bilayer thin films
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DOI：
10.1016/j.actamat.2011.06.029
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发表时间：
2011-09-01
期刊：
影响因子：
9.4
通讯作者：
Schneider, Jochen M.
中科院分区：
文献类型：
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作者：
Abdulkadhim, Ahmed;Takahashi, Tetsuya;Schneider, Jochen M.
采用组合磁控溅射法制备了TiCx/Al双层薄膜，研究了不同退火温度下C含量对反应产物的影响。根据弹性反冲检测分析数据校准的能量色散x射线分析，TiCx中的x值在0.4 ~ 1.0之间变化。在500 ~ 1000℃的温度下，通过x射线衍射研究了沉积样品在整个C/Ti范围内的TiCx和Al的形成。退火后，TiCx与Alto反应形成ti - al基金属间化合物。当温度低至700℃时，在x处观察到MAX相（空间群P6(3)/mmc）的形成
TiCx/Al bilayer thin films were synthesized using combinatorial magnetron sputtering to study the influence of C content on the reaction products at different annealing temperatures. Based on energy-dispersive X-ray analysis calibrated by elastic recoil detection analysis data, x in TiCx was varied from 0.4 to 1.0. Film constitution was studied by X-ray diffraction before and after annealing at temperatures from 500 to 1000 degrees C. The formation of TiCx and Al in the as-deposited samples over the whole C/Ti range was identified. Upon annealing, TiCx reacts with Alto form Ti-Al-based intermetallics. At temperatures as low as 700 degrees C, the formation of MAX phases (space group P6(3)/mmc) is observed at x