Effect of Current on Ni Catalyst Layer Used for Current-Enhanced CVD of Multilayer Graphene
Effect of Current on Ni Catalyst Layer Used for Current-Enhanced CVD of Multilayer Graphene
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DOI：
10.1109/iitc52079.2022.9881311
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发表时间：
2022-06
期刊：
影响因子：
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通讯作者：
Jumpei Tokida;Reno Hasumi;K. Ueno
中科院分区：
文献类型：
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作者：
Jumpei Tokida;Reno Hasumi;K. Ueno
发现当前应用在CVD期间使用Ni催化剂层增强多层石墨烯的结晶度。然而，表面粗糙度的降低一直是问题。研究了电流对Ni催化层的影响，发现电流促进了Ni（111）晶粒的生长，从而提高了压应力。达到应力极限后，Ni组织再次发生变化，应力得到松弛。Ni膜中的这种微结构变化与表面粗糙度相关。
Current application was found to enhance the crystallinity of multilayer graphene during CVD using a Ni catalyst layer. However, the reduction of surface roughness has been the issue. The effect of current to the Ni catalyst layer was investigated, and it was found that the current promotes the growth of Ni (111) grains, leading to the enhanced compressive stress. After reaching the stress limit, the Ni microstructure changed again and the stress was relaxed. Such microstructure changes in the Ni film correlated with the surface roughness.