Sub-40 nm polymer dot arrays by self-organized dewetting of electron beam treated ultrathin polymer films
Sub-40 nm polymer dot arrays by self-organized dewetting of electron beam treated ultrathin polymer films
复制标题
DOI：
10.1039/c2ra00956k
复制
发表时间：
2012-01-01
期刊：
影响因子：
3.9
通讯作者：
Sharma, Ashutosh
中科院分区：
文献类型：
--
作者：
Verma, Ankur;Sharma, Ashutosh
通过低剂量选择性电子束曝光的聚苯乙烯聚合物膜，然后通过其在水和极性有机溶剂的混合物下的增强的自组织去湿，制造亚40 nm尺寸有序的聚苯乙烯纳米液滴阵列。自组织加速了图案化并减小了特征尺寸，两者都超过10倍。
Sub-40 nm size ordered nanodroplet arrays of polystyrene are fabricated by a low dose selective electron beam exposure of an ultrathin polymer film followed by its intensified self organized dewetting under a mixture of water and polar organic solvents. The self organization speeds up patterning and reduces the feature size, both by more than 10 times.