Dependence of acid generation efficiency on the protection ratio of hydroxyl groups in chemically amplified electron beam, x-ray and EUV resists
Dependence of acid generation efficiency on the protection ratio of hydroxyl groups in chemically amplified electron beam, x-ray and EUV resists
复制标题
化学放大电子束、X 射线和 EUV 抗蚀剂中酸生成效率对羟基保护率的依赖性
DOI：
10.1116/1.1813452
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发表时间：
2004
影响因子：
1.4
通讯作者：
H. Komano
中科院分区：
文献类型：
--
作者：
Hiroki Yamamoto;T. Kozawa;A. Nakano;K. Okamoto;S. Tagawa;T. Ando;Mitsuru Sato;H. Komano
在用于电离辐射（例如电子束）的化学放大抗蚀剂中，酸的质子不是来自产酸剂，而是来自基础聚合物。这意味着基础聚合物的改性对产酸效率有很大影响。考察了聚4-羟基苯乙烯的相对酸产率与保护基的关系。保护基的选择对于产酸效率和酸分布均匀性是重要的。
In chemically amplified resists for ionizing radiation such as an electron beam, protons of acids come from not acid generators but base polymers. This means that the modification of base polymers has a great effect on the acid generation efficiency. The relation between relative acid yield and protecting groups of poly(4-hydroxystyrene) was examined. The selection of protecting groups is important for the acid generation efficiency and the acid distribution uniformity.