Photocatalytic NO removal on BiOI surface: The change from nonselective oxidation to selective oxidation
Photocatalytic NO removal on BiOI surface: The change from nonselective oxidation to selective oxidation
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DOI：
10.1016/j.apcatb.2015.01.014
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发表时间：
2015-06-01
影响因子：
22.1
通讯作者：
Zhang, Lizhi
中科院分区：
文献类型：
--
作者：
Dong, Guohui;Ho, Wingkei;Zhang, Lizhi
许多出版物研究了通过半导体光催化技术去除一氧化氮（NO）。然而，关于光催化NO去除过程的产物和机理的报道很少。本研究合成了 BiOI 空心微球，用于可见光照射下光催化去除 NO。结果表明，NO去除产物和NO去除机制可能会相互干扰。随着辐照时间的增加，NO的去除过程可以从非选择性氧化变为选择性氧化。同时，去除NO的产物可以由硝酸盐(NO3-)转变为二氧化氮(NO2)。这些有趣的变化归因于生成的 NO3-，它是由 NO 和 (OH)-O-中心点之间的反应产生的。生成的NO3-可以抑制(OH)-O-中心点的生成，从而导致NO去除产物和NO去除机制的改变。这项研究可以提高我们对光催化剂表面NO去除的理解，并为使用光催化剂去除NO提供指导。 (C) 2015 Elsevier B.V. 保留所有权利。
Numerous publications have investigated nitric oxide (NO) removal through semiconductor photocatalytic technology. However, few reports are available on the products and mechanisms of the photocatalytic NO removal process. In this study, BiOI hollow microspheres are synthesized for the photocatalytic removal of NO under the visible light irradiation. Results show that NO removal product and NO removal mechanism could interfere with each other. NO removal process could be changed from nonselective oxidation to selective oxidation as the irradiation time increases. Meanwhile, the product of NO removal could be changed from nitrate (NO3-) to nitrogen dioxide (NO2). These interesting changes were attributed to the generated NO3-, which was produced from the reactions between NO and (OH)-O-center dot. The generated NO3- could inhibit (OH)-O-center dot generation, thus leading to a change in the NO removal products and NO removal mechanism. This study can improve our understanding of NO removal on the photocatalyst surface and serve as a guide in using photocatalysts for NO removal. (C) 2015 Elsevier B.V. All rights reserved.