Generation of Quasi-CW Deep Ultraviolet Light below 200 nm by Two Successive Cavity Enhanced Second Harmonic Generators
Generation of Quasi-CW Deep Ultraviolet Light below 200 nm by Two Successive Cavity Enhanced Second Harmonic Generators
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DOI：
10.1143/jjap.50.042703
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发表时间：
2011-04
影响因子：
1.5
通讯作者：
Yun Zhang;Nobuyoshi Watanabe;Y. Okada-Shudo;M. Watanabe;M. Hyodo;Xiaoyan Wang;Yong Zhu;Chuangtian Chen;T. Kanai;S. Watanabe
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文献类型：
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作者：
Yun Zhang;Nobuyoshi Watanabe;Y. Okada-Shudo;M. Watanabe;M. Hyodo;Xiaoyan Wang;Yong Zhu;Chuangtian Chen;T. Kanai;S. Watanabe
通过对波长为798 nm、重复频率为82 MHz的钛宝石激光器的皮秒脉冲序列进行四倍频，我们获得了200 nm以下的相干深紫外光。两个倍频阶段发生在谐振腔中，可以提高转换效率。这使得总效率达到4.3%，输出功率高达60 mW。在第二阶段，采用KBe2BO3F2(KBBF)晶体作为非线性介质，转换效率比单程结构提高了约3倍。考虑到反射损耗，转换效率提高了五倍。
By frequency quadrupling a picosecond pulse train from a Ti: Sapphire laser with a wavelength of 798 nm and a repetition rate of 82 MHz, we generated a coherent deep ultraviolet light below 200 nm. Two frequency-doubling stages take place in resonant cavities that can increase conversion efficiency. This allows an overall efficiency of 4.3% and produces an output power of up to 60 mW. In the second stage, in which a KBe2BO3F2 (KBBF) crystal was employed as a nonlinear medium, conversion efficiency is increased by about three times compared with that of the single-pass configuration. Taking into account reflective loss, conversion efficiency is improved five times.