Analysis of carrier modulation in channel of ferroelectric-gate transistors having polar semiconductor

Analysis of carrier modulation in channel of ferroelectric-gate transistors having polar semiconductor
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DOI:
10.1016/j.tsf.2009.09.185
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发表时间:
2010-03
期刊:
影响因子:
2.1
通讯作者:
T. Fukushima;T. Yoshimura;K. Masuko;K. Maeda;A. Ashida;N. Fujimura
T. Fukushima;T. Yoshimura;K. Masuko;K. Maeda;A. Ashida;N. Fujimura
中科院分区:
材料科学3区
文献类型:
--
作者:
T. Fukushima;T. Yoshimura;K. Masuko;K. Maeda;A. Ashida;N. Fujimura

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