Nanostructured WO3/BiVO4 Heterojunction Films for Efficient Photoelectrochemical Water Splitting

Nanostructured WO3/BiVO4 Heterojunction Films for Efficient Photoelectrochemical Water Splitting
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DOI:
10.1021/nl2000743
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发表时间:
2011-05-01
期刊:
影响因子:
10.8
通讯作者:
Grimes, Craig A.
Grimes, Craig A.
中科院分区:
材料科学1区
文献类型:
--
作者:
Su, Jinzhan;Guo, Liejin;Grimes, Craig A.

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我们报道了一种用于光电化学水分解的新型异质结WO3/BiVO4光阳极。采用溶剂热沉积法在掺氟氧化锡(FTO)镀膜玻璃上制备了WO3纳米棒阵列薄膜,随后通过自旋镀膜法沉积了低带隙、2.4 eV、可见光响应的BiVO4薄膜。异质结结构提供了更高的光转换效率和光腐蚀稳定性。与平面WO3/BiVO4异质结膜相比,纳米棒阵列薄膜的光电化学性能得到了显著改善,我们认为这是由于WO3/BiVO4界面的高表面积和光生电荷的分离得到了改善。讨论了合成细节,并用场发射扫描电子显微镜和x射线衍射对薄膜的形貌和结构进行了表征。
We report on a novel heterojunction WO3/BiVO4 photoanode for photoelectrochemical water splitting. The heterojunction films are prepared by solvothermal deposition of a WO3 nanorod-array film onto fluorine-doped tin oxide (FTO) coated glass, with subsequent deposition of a low bandgap, 2.4 eV, visible light responding BiVO4 layer by spin-coating. The heterojunction structure offers enhanced photoconversion efficiency and increased photocorrosion stability. Compared to planar WO3/BiVO4 heterojunction films, the nanorod-array films show significantly improved photoelectrochemical properties due, we believe, to the high surface area and improved separation of the photogenerated charge at the WO3/BiVO4 interface. Synthesis details are discussed, with film morphologies and structures characterized by field emission scanning electron microscopy and X-ray diffraction.