Angular-Dependent Sputtering of Copper Single Crystals
Angular-Dependent Sputtering of Copper Single Crystals
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铜单晶的角度相关溅射
DOI：
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发表时间：
1963
期刊：
影响因子：
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通讯作者：
J. Kistemaker
中科院分区：
文献类型：
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作者：
J. Fluit;P. K. Rol;J. Kistemaker
测量了用20‐keV的Ne+、Ar+和Kr+离子轰击铜单晶时溅射产率与入射角的关系。已经发现的这种依赖关系的最大值和最小值可以与前几个晶格平面的不同方向的透明度相关联。由Ar+离子轰击溅射在铜（100）单晶表面的角依赖关系推导出的有效碰撞直径为0.39 a。考虑到晶格粒子的热运动，这个值比从波尔势的硬球近似计算得到的有效碰撞直径大3倍。
The dependence of the sputtering yield upon the angle of incidence for copper single crystals by bombardment with 20‐keV Ne+, Ar+, and Kr+ ions has been measured. The maxima and minima in this dependence, which have been found, can be correlated to a transparency in different directions of the first few lattice planes. An effective collision diameter deduced from the angular dependence of sputtering by Ar+ ion bombardment on a copper (100) single‐crystal surface was found to be 0.39 A. This value is 3 times larger than the effective collision diameter calculated from the hard sphere approximation for a Bohr potential, taking into account the thermal motion of the lattice particles.