The Effect of Fixed Charge in Tunnel-Barrier Contacts for Fermi-Level Depinning in Germanium

The Effect of Fixed Charge in Tunnel-Barrier Contacts for Fermi-Level Depinning in Germanium
复制标题

DOI:
10.1109/led.2012.2191386
复制
发表时间:
2012-06-01
影响因子:
4.9
通讯作者:
Saraswat, Krishna C.
Saraswat, Krishna C.
中科院分区:
工程技术2区
文献类型:
--
作者:
Roy, Arunanshu M.;Lin, Jason;Saraswat, Krishna C.

文献摘要

被引文献

相似文献

最近的实验表明,通过在界面处插入薄的隧道势垒,可以减少与n型Ge接触时的费米能级钉扎。在这些界面层中的固定电荷的存在下,可以有助于减少肖特基势垒。本文从理论上研究了隧道势垒固定电荷对接触电阻率的影响。通过模拟不同的隧道势垒材料和固定电荷密度,我们估计的固定电荷的大小需要这种机制发挥重要作用的费米能级unpinning。
Recent experiments have demonstrated a reduction of Fermi-level pinning in contacts to n-type Ge by the insertion of a thin tunnel barrier at the interface. The presence of fixed charge in these interface layers can contribute to Schottky-barrier reduction. This work theoretically studies the effect of tunnel-barrier fixed charge on the specific contact resistivity. By simulating various tunnel-barrier materials and fixed-charge densities, we estimate the magnitude of fixed charge required for this mechanism to play an important role in Fermi-level unpinning.