Preparation and Characterization of Epitaxial LiNbO3 Thin Films by Metal-Organic Chemical Vapor Deposition
Preparation and Characterization of Epitaxial LiNbO3 Thin Films by Metal-Organic Chemical Vapor Deposition
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金属有机化学气相沉积外延LiNbO3薄膜的制备及表征
DOI:
10.1143/jjap.38.5437
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发表时间:
1999
影响因子:
1.5
通讯作者:
Y. Sakabe
中科院分区:
文献类型:
--
作者:
K. Shiratsuyu;A. Sakurai;Katsuhiko Tanaka;Y. Sakabe
LiNbO3 thin films were prepared on sapphire substrates by the metal-organic chemical vapor deposition (MOCVD) technique, using lithium dipivaloylmethanate [Li(DPM)] and niobium pentaethoxide [Nb(O–C2H5)5] precursors. LiNbO3 films were deposited on (001) and (012) sapphire substrates and their crystalline structures were investigated by X-ray diffraction and pole figure analyses. The LiNbO3 films deposited on (001) sapphire substrates showed strong (001) orientation involving twin structures, and highly (100)-oriented films were obtained on the (012) sapphire substrates. The full width at half maximum (FWHM) of the X-ray rocking curves of (001)-oriented and (100)-oriented LiNbO3 films were, respectively, 0.16° and 0.21°. Field emission scanning electron microscope (FE-SEM) analysis showed that highly (100)-oriented LiNbO3 films had unique morphologies with long and narrow grains. The grains align in plane on the (012) sapphire substrate, and the c-axis of the LiNbO3 film is parallel to the short axis of the grains.