Process diagnostics and monitoring using the multipole resonance probe in an inhomogeneous plasma for ion-assisted deposition of optical coatings
Process diagnostics and monitoring using the multipole resonance probe in an inhomogeneous plasma for ion-assisted deposition of optical coatings
复制标题
在非均匀等离子体中使用多极共振探头进行过程诊断和监测，以进行光学涂层的离子辅助沉积
DOI：
10.1088/0963-0252/22/4/045008
复制
发表时间：
2013
影响因子：
3.8
通讯作者：
P. Awakowicz
中科院分区：
文献类型：
--
作者：
T. Styrnoll;J. Harhausen;M. Lapke;R. Storch;R. Brinkmann;R. Foest;A. Ohl;P. Awakowicz
报道了一种多极共振探针（MRP）在等离子离子辅助沉积（PIAD）过程中的诊断和监测应用。最近，MRP被认为是一种经济和工业兼容的等离子诊断设备（Lapke et al . 2011 plasma Sources Sci.）。技术。2004.04)。MRP的主要优点是它对介质涂层的坚固性和对电子密度测量的高灵敏度。所研究的PIAD工艺是由先进的等离子体源（APS）驱动的，该等离子体源在沉积室中产生离子束，用于生产高性能光学涂层。当背景中性压力为p0 ~ 20mpa时，等离子体从源区向接收区膨胀，导致空间分布不均匀。电子密度和电子温度随从衬底（ne ~ 109 cm−3和Te，eff ~ 2 eV）到APS （ne ~ 1012 cm−3和Te，eff ~ 20 eV）的距离而变化(Harhausen et al . 2012等离子体源科学。技术（21 035012）。等离子体参数的巨大变化对等离子体诊断在所有等离子体条件下精确操作是一个巨大的挑战。通过MRP获得的结果与选择作为参考诊断的Langmuir探针的结果进行了比较。结果表明，MRP适用于PIAD等离子体的表征以及电子密度监测。后者为复杂的工业等离子体环境提供了开发新控制方案的可能性。
The application of a multipole resonance probe (MRP) for diagnostic and monitoring purposes in a plasma ion-assisted deposition (PIAD) process is reported. Recently, the MRP was proposed as an economical and industry compatible plasma diagnostic device (Lapke et al 2011 Plasma Sources Sci. Technol. 20 042001). The major advantages of the MRP are its robustness against dielectric coating and its high sensitivity to measure the electron density. The PIAD process investigated is driven by the advanced plasma source (APS), which generates an ion beam in the deposition chamber for the production of high performance optical coatings. With a background neutral pressure of p0 ∼ 20 mPa the plasma expands from the source region into the recipient, leading to an inhomogeneous spatial distribution. Electron density and electron temperature vary over the distance from substrate (ne ∼ 109 cm−3 and Te,eff ∼ 2 eV) to the APS (ne ≳ 1012 cm−3 and Te,eff ∼ 20 eV) (Harhausen et al 2012 Plasma Sources Sci. Technol. 21 035012). This huge variation of the plasma parameters represents a big challenge for plasma diagnostics to operate precisely for all plasma conditions. The results obtained by the MRP are compared to those from a Langmuir probe chosen as reference diagnostics. It is demonstrated that the MRP is suited for the characterization of the PIAD plasma as well as for electron density monitoring. The latter aspect offers the possibility to develop new control schemes for complex industrial plasma environments.