Synthesis and fast transfer of monolayer MoS2 on reusable fused silica
Synthesis and fast transfer of monolayer MoS2 on reusable fused silica
复制标题
可重复使用熔融石英上单层 MoS2 的合成和快速转移
DOI：
10.1039/c7nr01755c
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发表时间：
2017-06-07
期刊：
影响因子：
6.7
通讯作者：
Xu, Mingsheng
中科院分区：
文献类型：
--
作者：
Liang, Tao;Xie, Shuang;Xu, Mingsheng
从超导体、金属、半导体到绝缘体的原子薄二维材料正在成为下一代数字电子和光电应用的潜在候选材料。需要解决它们在常用基质上的合成以及快速转移到大量所需基质上的问题，以满足实际应用的工业化标准。在本研究中，研究了无定形、透明且廉价的熔融二氧化硅作为 MoS2 合成的基质。评估了 MoS2 在熔融石英上的生长行为及其晶体质量。此外，还开发了一种新方法，可以在15秒内从熔融石英表面快速剥离MoS2（即在酸性溶液中蚀刻以分离边缘，并通过空气和水界面上的毛细管力完成分层）。熔融石英可以重复使用至少三次。此外，所产生的MoS2域没有表现出明显的质量下降。这些结果支持了在非晶和可回收基材上合成MoS2的可行性，以及节省时间的转移以经济有效地高质量生产其他二维材料。
Atomically thin, two-dimensional materials ranging from superconductors, metals, semiconductors to insulators are emerging as potential candidates for the next-generation digital electronics and optoelectronic applications. Their synthesis on a commonly used substrate and fast transfer to a plenty of desired substrates need to be addressed to meet the industrialization criteria for practical applications. In this study, fused silica, which is amorphous, transparent, and inexpensive, was examined as a substrate for MoS2 synthesis. The MoS2 growth behavior on fused silica and its crystal quality were evaluated. In addition, a novel way was developed to quickly peel off MoS2 from the fused silica surface within 15 s (i.e., etching in an acidic solution to detach the edge and completing the delamination via a capillary force at the interface between air and water). The fused silica could be reused at least three times. Moreover, the produced MoS2 domains showed no obvious degradation of quality. These results support the feasibility of MoS2 synthesis on amorphous and recyclable substrates and also the time-saving transfer for the cost-effective and high-quality production of other two-dimensional materials.