Dissociative Excitation Reaction of CH3CN with the Discharge Flow of Ar: Prediction of the [N]/([N]+[C]) Ratio of Hydrogenated Amorphous Carbon Nitride Films in the Desiccated System
Dissociative Excitation Reaction of CH3CN with the Discharge Flow of Ar: Prediction of the [N]/([N]+[C]) Ratio of Hydrogenated Amorphous Carbon Nitride Films in the Desiccated System
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DOI：
10.1143/jjap.42.3684
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发表时间：
2003-06
影响因子：
1.5
通讯作者：
Haruhiko Ito;H. Miki;K. Namiki;N. Ito;H. Saitoh
中科院分区：
文献类型：
--
作者：
Haruhiko Ito;H. Miki;K. Namiki;N. Ito;H. Saitoh
在微波放电Ar流中，观察到了CH_3CN与Ar的解离激发反应中CN（B ~ 2 +-X ~ 2+）和CH（A ~ 2 Δ-X ~ 2+）跃迁的发射光谱。通过使用P2 O 5作为干燥剂除去包含在起始材料中并吸附在装置壁上的H2O分子。Ar的压力PAr在0.1-1.0托的范围内。在干燥的体系中，CH（A ~ 2 Δ）和CN（B ~ 2 Δ +）态的浓度之比NCH（A）/NCN（B）小于未干燥的体系。在干燥体系中形成的a-CNx：H膜的[N]/（[N]+[C]）比值为1.018，几乎与PAr无关。
Emission spectra of the CN(B2Σ+–X2Σ+) and CH(A2Δ–X2Π) transitions were observed in the dissociative excitation reaction of CH3CN with the microwave-discharge flow of Ar. The H2O molecules contained in the starting materials and adsorbed on the wall of the apparatus were removed by using P2O5 as a desiccant. The pressure of Ar, PAr, was in the range of 0.1–1.0 Torr. The ratio of the concentrations of the CH(A2Δ) and CN(B2Σ+) states, NCH(A)/NCN(B), in the desiccated system was found to be smaller than that in the system without desiccation. The [N]/([N]+[C]) ratio of the a-CNx:H films formed in the desiccated system was predicted to be ≈0.18, being nearly independent of PAr.