Rapid fabrication of uniformly sized nanopores and nanopore arrays for parallel DNA analysis
Rapid fabrication of uniformly sized nanopores and nanopore arrays for parallel DNA analysis
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DOI：
10.1002/adma.200601191
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发表时间：
2006-12-04
影响因子：
29.4
通讯作者：
Meller, Amit
中科院分区：
文献类型：
--
作者：
Kim, Min Jun;Wanunu, Meni;Meller, Amit
使用高强度电子束可以在Si3N4膜中快速制造均匀的纳米孔和纳米孔阵列(见图)。在电子束辐照下观察到了孔的膨胀或收缩，并用于控制制备尺寸在2-20 nm范围内的高度均匀的纳米孔。我们的纳米孔呈现出截断的双锥结构，如3D-TEM断层扫描所显示的那样。
Rapid fabrication of uniform nanopores and nanopore arrays in Si3N4 membranes (see figure) is achieved using a high-intensity electron beam. Expansion or contraction of the pores under electron-beam irradiation is observed and utilized for the controlled fabrication of highly uniform nanopores in the size range 2-20 nm. Our nanopores exhibit a truncated double-cone structure, as revealed by 3D-TEM tomography.